Substrate Bombardment During RF Sputtering

Rf sputtering technique pdf

Cathode Ion Bombardment in RF Photoguns

Preparation of delafossite CuFeO2 thin films by rf- sputtering on conventional glass substrate

CuFeO2 is a delafossite-type compound and is a well known p-type semiconductor. The growth of delafossite CuFeO2 thin films on conventional glass substrate by radio-frequency sputtering is reported. The deposition, performed at room temperature leads to an amorphous phase with extremely low roughness and high density. The films consisted of a well crystallized delafossite CuFeO2 after heat trea...

On Universality in Sputtering Yields Due to Cluster Bombardment.

Molecular dynamics simulations, in which atomic and molecular solids are bombarded by Arn (n = 60-2953) clusters, are used to explain the physics that underlie the "universal relation" of the sputtering yield Y per cluster atom versus incident energy E per cluster atom (Y/n vs E/n). We show that a better representation to unify the results is Y/(E/U0) versus (E/U0)/n, where U0 is the sample coh...

Effect of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Elaborated by Sputtering RF-Magnetron

Thin zinc oxide doped with gallium layers were prepared by rf-magnetron sputtering from nanoparticles synthesized by sol-gel method. Increasing the deposition temperature has resulted in a change of preferred orientations of (002) with an intermediate step-like structure of powder. The films showed different morphologies of the surface of the grains that are dependent on the deposition temperat...